Conventionally , this involves coating a silicon wafer with a thin layer of light - sensitive polymer , shining uv light onto it through a template , and then dissolving the affected areas to create a pattern 和傳統(tǒng)方法一樣,先給硅片薄薄地涂上一層對光線十分敏感的聚合物,再隔著一個模板用紫外線照射硅片,然后溶解那些受到影響的區(qū)域,這樣就制成了一個圖案。